Kingrun

單晶圓光(guāng)阻剝離機

設備特點:

·Soaking tank内 8” cassette slot(20 mm pitch)最多(duō)可(kě)容納 10 片芯片，配置Agitation 和(hé)兆聲波功能獨立運作。
·浸泡槽内化(huà)學品經過in line heater内部循環，高(gāo)壓spin chamber溶劑回收使用(yòng)。
·高(gāo)壓Spin chamber配備 HPC和(hé)二流體功能，可(kě)依産品制程特性做(zuò)調整。
·最終清洗腔體，以二流體去離子水(shuǐ)清洗爲主，輔以DI Rinse功能。
·制程腔體獨立設計，避免制程交互污染。
·Spin chamber芯片雙面清洗能力。

主要技術參數：

Purpose :

Applicable :

Throughput(UPH) :

Chamber Type :

Load / Unload :

Chuck :

Equipment Control :

Process Feature

Process Temp :

Drain :

This equipment can do hard-PR removed

8”/6” Wafer PR Stripping / Flux clean

60 pcs (depend on high pressure stripping process)

Soaking tank/High pressure spin chamber/Final rinse chamber

2 sets ,open cassette type with wafer edge align

Edge grip chuck

Touch type IPC + PLC Control

·55 liter SUS soaking tank
·Soaking process with agitation and megasonic function
·HPC 60~200 kg/cm2
·DI/Solvent hi-jet process chamber, nozzle recipe is programmable
·DI/N2 2-Fluid final clean chamber, nozzle recipe is programmable
·N2：Jet Nozzle 5~7kg/cm2
·O2 extinguisher

Maximum 95 °C

By Gravitating drain with cooling tank