單晶圓/陶瓷片超聲波光(guāng)阻噴塗機
設備特點:
·超聲波驅動器可(kě)産生120KHz的(de)震蕩頻(pín)率,能将液體霧化(huà)成爲18µm的(de)液滴。
·Micro flow 多(duō)活塞供料系統不僅可(kě)連續供料,且可(kě)提供1µl/min~25ml/min之間的(de)流量,可(kě)滿足各式的(de)制程需求。
·超聲波噴頭是由伺服馬達所帶動,移動速度最高(gāo)可(kě)達到200mm/sec,且可(kě)依照(zhào)制程規劃實時(shí)改變速度。
·獨特的(de)多(duō)孔隙陶瓷加熱(rè)平台設計,最高(gāo)可(kě)加熱(rè)到60度,能夠同時(shí)進行真空吸附及加熱(rè)晶圓。獨立的(de)冷(lěng)熱(rè)闆槽,适 合對(duì)塗布後的(de)晶圓進行Soft bake。
主要技術參數:
Purpose :
Applicable :
Throughput(UPH) :
Chamber Type :
Load / Unload :
Chuck :
Equipment Control :
Process Feature
This equipment can do thin film coating process
8” Wafer PR spray coating
45 pcs (depend on film thickness)
Single wafer ultrasonic spray coating process chamber
2 sets ,open cassette type
Vacuum chuck with heat disk
Touch type IPC + PLC Control
·Wide range of flow rates – 1µl/min to 25ml/min
·High accuracy dispense ±0.5%
·Continuous flow capability
·Up to 80% reduction in material consumption
·Uniformity of film thickness is within ±10%
·Liquid can be atomization with viscosity less than 50cp
·Ultrasonic driver power levels are generally under 15 watts
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